Publication detail

Micro-and nanostructuring of amorphous chalcogenide glasses by direct writing laser and electron beam lithography for micro-optical elements

Authors: Schroeter Siegmund | Vlček Miroslav | poehlmann Ruediger | Glaser Tilman | Bartelt Hartmut

Year: 2004

Type of publication: ostatní - přednáška nebo poster

Name of source: Book of Abstract

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Language	Name	Abstract	Keywords
cze	Mikro a nanostruktura amorfních chalkogenidových skel získaných pomocí přímé laserové a elektronové litografie pro mikrooptické prvky	Byla studována mikro a nanostruktura amorfních tenkých vrstev chalkogenidových skel získaných pomocí laserové a elektronové litografie pro mikrooptické prvky
eng	Micro-and nanostructuring of amorphous chalcogenide glasses by direct writing laser and electron beam lithography for micro-optical elements	Direct writing laser lithography at 442 nm and 244 nm as well as electron beam lithography are applied to modify the properties of thin amorphous chalcogenide layers deposited by vacuum thermal evaporation onto glass or silicon substrates. Exposure induced modifications of material properties or/and of the topography of the samples in dependence on power density, exposed dose and wavelength are examined. The influence of exposure conditions on the etching characteristics are investigated for amine based nonaqueous solvents. Several diffractive optical components have been fabricated and characterised.	amorphous chalcogenide glasses ;electron beam lithography;

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